Method of smoothing waveguide structures

Details Method of smoothing waveguide structures Method of smoothing waveguide structures

2007-08-28

2007-08-28

Norton, Nadine G. (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C385S014000, C385S036000, C385S129000, C385S130000, C385S131000, C385S132000, C318S254100, C216S024000, C065S386000

Reexamination Certificate

active

10721448

ABSTRACT:
A semiconductor based structure containing substantially smoothed waveguides having a rounded surface is disclosed, as well as methods of fabricating such a structure. The substantially smoothed waveguides may be formed of waveguide materials such as amorphous silicon or stoichiometric silicon nitride. The substantially smoothed waveguides are formed with an isotropic wet etch combined with sonic energy.

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