Radiographic image conversion panel and production method...

Details Radiographic image conversion panel and production method... Radiographic image conversion panel and production method...

2007-10-16

2007-10-16

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Retrieving image made using radiation imagery

C430S139000, C430S496000, C250S484400, C427S157000, C427S155000

Reexamination Certificate

active

11593556

ABSTRACT:
A radiographic image conversion panel containing a substrate having thereon a phosphor layer formed by a vapor-accumulating method, wherein the phosphor layer has a thickness distribution of not more than ±20%, the thickness distribution being defined by the formula: ((Dmax−Dmin)/(Dmax+Dmin))×100, provided that Dmaxis a maximum thickness of the phosphor layer; and Dminis a minimum thickness of the phosphor layer.

REFERENCES:
patent: 5851428 (1998-12-01), Matsuda et al.
patent: 6707050 (2004-03-01), Hosoi
patent: 2002/0192501 (2002-12-01), Yano et al.
patent: 2004/0069955 (2004-04-01), Maezawa et al.
patent: 2004/0104376 (2004-06-01), Maezawa et al.
patent: 2004/0155224 (2004-08-01), Nakano et al.
patent: 2004/0159801 (2004-08-01), Kishinami et al.
patent: 2005/0040340 (2005-02-01), Morikawa et al.
patent: 0 437 355 (1991-07-01), None
patent: 437355 (1991-07-01), None
patent: 1 191 081 (2002-03-01), None
patent: 191081 (2002-03-01), None
patent: 1 288 680 (2003-03-01), None
patent: 1288680 (2003-03-01), None

Affiliated with

Also associated with

Rating

Radiographic image conversion panel and production method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiographic image conversion panel and production method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiographic image conversion panel and production method... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3843162