Polymerizable fluorinated ester compounds and their...

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...

Reexamination Certificate

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C570S136000, C570S142000, C570S182000, C570S186000

Reexamination Certificate

active

10958373

ABSTRACT:
Polymerizable fluorinated ester compounds having formulae (1) and (2) are novel wherein R1is H, methyl or trifluoromethyl, R2and R3are H or a monovalent hydrocarbon group, R2and R3may form a ring, R4is H, OH or a monovalent hydrocarbon group, and R5is an acid labile group. They are useful as monomers to produce polymers for the manufacture of radiation-sensitive resist compositions which have high transparency to radiation having a wavelength of up to 500 nm and exhibit good development properties due to the presence of phenol-like acidic hydroxyl groups

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patent: 2004/0192867 (2004-09-01), Narita et al.
patent: 2002-072484 (2002-03-01), None
patent: 2003-040840 (2003-02-01), None
patent: 2003-192729 (2003-07-01), None
G. Wallraff et al., “Active Fluororesists for 157nm lithography in 2nd International Symposium on 157 nm Lithography” May 14-17, 2001.
T. Nakai et al., “Perfluoro-Enolate Chemistry: Facile Generation and Unique Reactivitires of Metal F-1-Propen-2-Olates,” Tetrahedron Letters, vol. 29, No. 33, pp. 4119-4122, (1998).
T. Nakai et al., Organic Syntheses, vol. 76, pp. 151-157, (1998).

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