Method of characterizing flare

Details Method of characterizing flare Method of characterizing flare

2007-10-02

2007-10-02

Stafira, Michael P. (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

Reexamination Certificate

active

10860853

ABSTRACT:
A method of measuring flare in an optical lithographic system utilizes an exposure mask with first and second discrete opaque features each having rotational symmetry of order greater than four and of different respective areas. The exposure mask is positioned in the lithographic system such that actinic radiation emitted by the lithographic system illuminates the sensitive surface of an exposure target through the exposure mask. The extent to which regions of the sensitive surface that are within the geometric image of a feature of the exposure mask are exposed to actinic radiation during due to flare is measured.

REFERENCES:
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Futatsuya, Hiroki; Yao, Teruyoshi; Osawa, Morimi; Ogino, Kozo; Hoshino, Hiromi; Arimoto, Hiroshi; Machida, Yasuhide and Asai, Satoru, “Model-Based OPC/DRC Considering Local Flare Effects,” Optical Microlithography XVII, Proceedings of SPIE Vo. 5377 (2004) pp. 451-458.

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