Membrane and the use thereof

Plastic and nonmetallic article shaping or treating: processes – Pore forming in situ – By gas forming or expanding

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C264S041000, C264S050000, C521S064000, C210S500390, C210S500410, C210S500230

Reexamination Certificate

active

10332327

ABSTRACT:
The invention relates to a membrane that consists of a polymer or a polymer mixture. The aim of the invention is to produce membranes, especially planar membranes or hollow fiber membranes that have an as high a separation efficiency as possible while simultaneously having a high membrane efficiency. To this end, the membrane has a gas- or liquid-permeable bicontinuous foam structure with orifices in the interior whose diameters do not exceed 500 nm.

REFERENCES:
patent: 4380594 (1983-04-01), Siggel et al.
patent: 4473665 (1984-09-01), Martini-Vvedensky et al.
patent: 5013767 (1991-05-01), Malon et al.
patent: 5116883 (1992-05-01), LeMay
patent: 5209848 (1993-05-01), Jeanes et al.
patent: 5418061 (1995-05-01), Parham et al.
patent: 5422377 (1995-06-01), Aubert
patent: 5547575 (1996-08-01), Demmer et al.
patent: 5710187 (1998-01-01), Steckle et al.
patent: 5723510 (1998-03-01), Kabumoto et al.
patent: 5830923 (1998-11-01), Venkataraman
patent: 5853633 (1998-12-01), Kono et al.
patent: 5980795 (1999-11-01), Klotzer et al.
patent: 6534084 (2003-03-01), Vyakarnam et al.
patent: 6620356 (2003-09-01), Wong et al.
patent: 6808375 (2004-10-01), Klotzer
patent: 6902693 (2005-06-01), Klotzer

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Membrane and the use thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Membrane and the use thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Membrane and the use thereof will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3836236

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.