Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2007-08-21
2007-08-21
Lee, HWA (Andrew) (Department: 2886)
Optics: measuring and testing
By light interference
For dimensional measurement
Reexamination Certificate
active
11289394
ABSTRACT:
A semiconductor fabricating apparatus for etching a semiconductor wafer, which is placed in a chamber and which has a multiple-layer film composed of a first film formed on a surface thereof and a second film formed on the first film, using plasma generated in the chamber. The semiconductor fabricating apparatus includes a light detector that detects a change in an amount of light with a plurality of wavelengths obtained from the surface of the wafer for a predetermined time during which the second film is etched, and a detection unit that detects a thickness of the first film based on a specific waveform obtained from an output of the detector.
REFERENCES:
patent: 4767495 (1988-08-01), Nishioka
patent: 5552016 (1996-09-01), Ghanayem
patent: 5648849 (1997-07-01), Canteloup
patent: 5658418 (1997-08-01), Coronel
patent: 5835226 (1998-11-01), Berman
patent: 5928532 (1999-07-01), Koshimizu
patent: 6081334 (2000-06-01), Grimbergen
patent: 6207008 (2001-03-01), Kijima
patent: 6261470 (2001-07-01), Smith, Jr.
patent: 6297064 (2001-10-01), Koshimizu
patent: 6306669 (2001-10-01), Yano
patent: 6383402 (2002-05-01), Smith, Jr.
patent: 6414499 (2002-07-01), Yano
patent: 6510706 (2003-01-01), Schertler
patent: 6815228 (2004-11-01), Usui
patent: 6888639 (2005-05-01), Goebel
patent: 6903826 (2005-06-01), Usui
patent: 6961131 (2005-11-01), Usui et al.
patent: 6972848 (2005-12-01), Usui et al.
patent: 2001/0016053 (2001-08-01), Dickson
patent: 2003/0085198 (2003-05-01), Yi et al.
patent: 2004/0040658 (2004-03-01), Usui
patent: 2004/0174530 (2004-09-01), Usui et al.
patent: 2005/0018207 (2005-01-01), Usui
patent: 0412728 (1991-02-01), None
patent: 1 089 146 (2001-04-01), None
patent: 61-53728 (1986-03-01), None
patent: 63-200533 (1988-08-01), None
patent: 64-68932 (1989-03-01), None
patent: 5-179467 (1993-07-01), None
patent: 6-84849 (1994-03-01), None
patent: 2000-97648 (2000-04-01), None
patent: 2000-106356 (2000-04-01), None
patent: 2000-228397 (2000-08-01), None
patent: 2000-324297 (2000-11-01), None
Lide et al, CRC Handbook of Chemistry and Physics, CRC Press. RWB Pearse and AG Gaydon, “The Identification of Molecular Spectra”, John Wiley & Sons, 1976.
Sasaki et al, “Estimation Of Component Spectal Curves From Unknown Mixture Spectra”, App. Opt. vol. 23, pp. 1955-1959 (1984).
Jyouo Kazuhiro
Ono Tetsuo
Usui Tatehito
Yoshigai Motohiko
Hitachi High-Technologies Corporation
Lee HWA (Andrew)
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