Method of manufacturing thin film magnetic head

Details Method of manufacturing thin film magnetic head Method of manufacturing thin film magnetic head

2007-05-01

2007-05-01

Kim, Paul D. (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603080, C029S603130, C029S603140, C029S603150, C029S603180, C205S199000, C205S122000, C360S125330, C360S317000, C427S127000, C427S128000, C451S005000, C451S041000

Reexamination Certificate

active

11230683

ABSTRACT:
A wire gap film is formed on a flat coplanar surface formed on a bottom pole by a bottom track pole and a thin film coil, first and second magnetic material films constituting a top pole are formed on a flat surface of the thin film coil, and the first and second magnetic material films, write gap film and bottom track pole are partially removed forming a top track pole and trim structure. The thin film coil is formed by first and second thin film coil halves having self-aligned coil windings and have a CVD formed first conductive film, and an electrolytic plating formed second conductive film. A thin insulating film is interposed between successive coil windings of the first and second thin film coil halves. Jumper wirings, formed with the top pole, connect innermost and outermost coil windings of the first and second thin film coil halves respectively.

REFERENCES:
patent: 6191918 (2001-02-01), Clarke et al.
patent: 6466401 (2002-10-01), Hong et al.
patent: 6668442 (2003-12-01), Sasaki
patent: 6826012 (2004-11-01), Sasaki
patent: 6836956 (2005-01-01), Sasaki
patent: 11283218 (1999-10-01), None
“High-performance writer using high-moment sputtered films in top and bottom poles”; Yingjian Chen; Liu, F.; Stoev, K.; Xiaozhong Dang; Hua-Ching Tong; Qing He; Yiming Huai; Magnetics, IEEE Transactions on vol. 38, Issue 5, Part 1, Sep. 2002 pp. 2222-2224.

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