Exposure apparatus and method

Details Exposure apparatus and method Exposure apparatus and method

2007-06-05

2007-06-05

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

Reexamination Certificate

active

11014166

ABSTRACT:
An exposure method includes the steps of introducing fluid between a surface of an object to be exposed, and a final surface of a projection optical system, displacing an interface of the fluid arranged between the surface of the object and the final surface of the projection optical system, and projecting a pattern on a mask onto the object via the projection optical system and the fluid.

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patent: 1606128 (2005-04-01), None
patent: WO 99/49504 (1999-09-01), None
Smith, Bruce, et al. “Extreme-NA Water Immersion Lithography for 35-65 nm Technology,” Rochester Institute of Technology, International Symposium on 157 nm Lithography, Sep. 3-6, 2002. pp. 1-15.
Korean Office Action dated Apr. 17, 2006, issued in a corresponding Korean patent applicaiton, No. 10-2004-0110851, with English translation.
Chinese Office Action dated Dec. 8, 2006, issued in corresponding Chinese patent application No. 2004-100114865, and English translation.

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