Photocopying – Projection printing and copying cameras – Detailed holder for photosensitive paper
Reexamination Certificate
2007-11-06
2007-11-06
Lee, Diane (Department: 2851)
Photocopying
Projection printing and copying cameras
Detailed holder for photosensitive paper
Reexamination Certificate
active
11147467
ABSTRACT:
A lithographic apparatus has an illumination system that conditions a radiation beam and a patterning device support that supports a patterning device. The patterning device patterns the radiation beam. The lithographic apparatus also has a substrate support that supports a substrate, a machine frame that supports the substrate support, a projection system that projects the patterned beam onto a target portion of the substrate, and a substrate support drive that moves the substrate support in at least one direction. The lithographic apparatus can have a reaction mass, a balance mass, a base frame, where the substrate support drive is configured to generate a force in the at least one direction between the substrate support and the reaction mass, the balance mass, or the support frame.
REFERENCES:
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5500736 (1996-03-01), Koitabashi et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5530482 (1996-06-01), Gove et al.
patent: 5579147 (1996-11-01), Mori et al.
patent: 5677703 (1997-10-01), Bhuva et al.
patent: 5808797 (1998-09-01), Bloom et al.
patent: 5982553 (1999-11-01), Bloom et al.
patent: 6133986 (2000-10-01), Johnson
patent: 6177980 (2001-01-01), Johnson
patent: 6445440 (2002-09-01), Bisschops et al.
patent: 6687041 (2004-02-01), Sandstrom
patent: 6747783 (2004-06-01), Sandstrom
patent: 6795169 (2004-09-01), Tanaka et al.
patent: 6806897 (2004-10-01), Kataoka et al.
patent: 6811953 (2004-11-01), Hatada et al.
patent: 6885431 (2005-04-01), Hara
patent: 2004/0008331 (2004-01-01), Cox et al.
patent: 2004/0041104 (2004-03-01), Liebregts et al.
patent: 2004/0130561 (2004-07-01), Jain
patent: 2004/0252287 (2004-12-01), Binnard et al.
patent: 2005/0007572 (2005-01-01), George et al.
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None
Cox Henrikus Herman Marie
Jacobs Hernes
Van Der Schoot Harmen Klaas
Vosters Petrus Matthijs Henricus
ASML Netherlands B.V.
Liu Chia-how Michael
Sterne Kessler Goldstein & Fox PLLC
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