Surface treatment system and method

Coating processes – Coating by vapor – gas – or smoke

Reexamination Certificate

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C427S569000, C118S719000, C118S7230ER, C118S7230AN

Reexamination Certificate

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10496219

ABSTRACT:
A surface treatment system in which gas for a deposition reaction is injected into a deposition chamber and power is applied to form a deposition reaction to form a deposition layer at a surface of an object or surface treatment, wherein the deposition chamber has a plurality of deposition spaces disposed in parallel and a convey unit for conveying one or more objects of surface treatment to each deposition space or discharging the objects of surface treatment from each deposition space after a deposition reaction.

REFERENCES:
patent: 4501766 (1985-02-01), Suzuki et al.
patent: 4728406 (1988-03-01), Banerjee et al.
patent: 4834020 (1989-05-01), Bartholomew et al.
patent: 5122391 (1992-06-01), Mayer
patent: 5124180 (1992-06-01), Proscia
patent: 5545436 (1996-08-01), Saito
patent: 5599403 (1997-02-01), Kariya et al.
patent: 5944900 (1999-08-01), Tran
patent: 5976258 (1999-11-01), Kleiner
patent: 6171396 (2001-01-01), Tahara
patent: 6447612 (2002-09-01), Moriyama et al.
patent: 6666923 (2003-12-01), Jeong et al.
patent: 6705245 (2004-03-01), Jeong et al.
patent: 6827787 (2004-12-01), Yonezawa et al.
patent: 0 909 836 (1999-04-01), None
patent: WO 99/27157 (1999-06-01), None

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