Electron beam exposure apparatus

Details Electron beam exposure apparatus Electron beam exposure apparatus

2007-06-12

2007-06-12

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S491100, C250S492200, C250S492300, C250S442110, C250S3960ML, C250S398000

Reexamination Certificate

active

11074645

ABSTRACT:
An electron beam exposure apparatus comprising: column1for irradiating an electron beam to wafer10serving as a sample; sample chamber3having vacuum pump40as a vacuum exhaustion unit for controlling the internal unit to a vacuum atmosphere; stage4A arranged in the sample chamber3for holding and moving the wafer10;and first mounting5A for elastically supporting the column1with respect to the sample chamber3.

REFERENCES:
patent: 5185530 (1993-02-01), Norioka et al.
patent: 5508518 (1996-04-01), Kendall
patent: 5834783 (1998-11-01), Muraki et al.
patent: 5973332 (1999-10-01), Muraki et al.
patent: 6166387 (2000-12-01), Muraki et al.
patent: 6323499 (2001-11-01), Muraki et al.
patent: 6744054 (2004-06-01), Mizouchi et al.
patent: 6965426 (2005-11-01), Takashima
patent: 7057193 (2006-06-01), Akutsu
patent: 2002/0070345 (2002-06-01), Mizouchi et al.
patent: 2004/0142715 (2004-07-01), Takashima
patent: 0 797 236 (1997-09-01), None
patent: 1 143 492 (2001-10-01), None
patent: 1 215 805 (2002-06-01), None
patent: 1458778 (1976-12-01), None
patent: 4-192245 (1992-07-01), None
patent: 5-74695 (1993-03-01), None
patent: 8-320570 (1996-12-01), None
patent: 9-245708 (1997-09-01), None
patent: 11-111598 (1999-04-01), None
patent: 2002-175770 (2002-06-01), None
patent: 2002-260566 (2002-09-01), None
patent: 2003-288856 (2003-10-01), None
European Search Report dated Aug. 28, 2006, issued in corresponding European patent application No. EP 05 00 5017, forwarded in a Communication dated Sep. 8, 2006.

Affiliated with

Also associated with

Rating

Electron beam exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3809013