Compositions – Etching or brightening compositions
Reexamination Certificate
2007-01-09
2007-01-09
Mills, Gregory (Department: 1765)
Compositions
Etching or brightening compositions
C252S079400, C438S745000, C438S754000
Reexamination Certificate
active
10451230
ABSTRACT:
The present invention is related to a composition comprising an oxidizing compound and a complexing compound with the chemical formula wherein R1, R2, R3 and R4 are selected from the group consisting of H and any organic side chain. The oxidizing compound can be in the form of an aqueous solution. The complexing compound is for complexing metal ions. Metal ions can be present in the solution or in an external medium being contacted with the solution. The present invention can be used for cleaning a semiconductor substrate
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Kem, et al.; Cleaning Solutions Based on Hydrogen Peroxide for use in Silicon Semiconductor Technology; RCA Review, Jun. 1970; pp. 187-205.
Mertens, et al.; Wafer Cleaning: A Quantifiable Process Step; Proc. of the 8thInternational Symposium on Silicon Materials Science and Technology; PV 98-1 (1998).
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Kirk-Othmer Encyclopedia of Chemical Technology (4thEd.), vol. 13, p. 965, no date avail.
Kern, et al.; Cleaning Solutions Based on Hydrogen Peroxide for use in Silicon Semiconductor Technology; RCA Review, Jun. 1970; pp. 187-205.
Mertens, et al.; Wafer Cleaning: A Quantifiable Process Step; Proc. of the 8thInternational Symposium on Silicon Materials Science and Technology; PV 98-1 (1998).
Mertens, et al.; Proc of the 5thInternational Symp. on Cleaning Technology in Semiconductor Manufacturing; PV 97-35 (1997).
Doll Oliver
Fester Albrecht
Kolbesen Bernd
Mertens Paul
Vos Rita
Air Products and Chemicals Inc.
IMEC vzw
Knobbe Martens Olson & Bear LLP
Mills Gregory
Umez-Eronini Lynette T.
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