Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2007-04-03
2007-04-03
Ahmed, Samir (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S149000, C250S559400, C356S237400
Reexamination Certificate
active
10908284
ABSTRACT:
A photomask, method of designing, of fabricating, of designing, a method of inspecting and a system for designing the photomask. The photomask, includes: a cell region, the cell region comprising one or more chip regions, each chip region comprising a pattern of opaque and clear sub-regions corresponding to features of an integrated circuit chip and one or more kerf regions, each kerf region comprising a pattern of opaque and clear sub-regions corresponding to features of an integrated circuit kerf; a clear region formed adjacent to a side of a copy region, the copy region comprising opaque and clear sub-regions that are copies of at least a part of the cell region; and an opaque region between the clear region and the cell region.
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“Exposure Mask Diagnostic and Disposition Targets”, IBM Technical Disclosure Bulletin, vol. 22, Issue 10, pp. 4505-4507, 1980.
Rankin Jed H.
Watts Andrew J.
Ahmed Samir
Canale Anthony J.
Schmeiser Olsen & Watts
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