Synthesis of photoresist polymers

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C525S261000, C525S263000, C525S220000, C525S222000, C525S230000, C526S222000, C526S281000

Reexamination Certificate

active

10877110

ABSTRACT:
The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.

REFERENCES:
patent: 5314962 (1994-05-01), Otsu et al.
patent: 5489654 (1996-02-01), Clouet
patent: 5658986 (1997-08-01), Clouet
patent: 5866047 (1999-02-01), Nagino et al.
patent: 5929271 (1999-07-01), Hada et al.
patent: 5962184 (1999-10-01), Allen et al.
patent: 6013416 (2000-01-01), Nozaki et al.
patent: 6048666 (2000-04-01), Niwa et al.
patent: 6087063 (2000-07-01), Hada et al.
patent: 6140010 (2000-10-01), Iwasa et al.
patent: 6153705 (2000-11-01), Corpart et al.
patent: 6190833 (2001-02-01), Shiota et al.
patent: 6207342 (2001-03-01), Takechi et al.
patent: 6280911 (2001-08-01), Trefonas, III
patent: 6303266 (2001-10-01), Okino et al.
patent: 6303268 (2001-10-01), Namba et al.
patent: 6380335 (2002-04-01), Charmot et al.
patent: 6391529 (2002-05-01), Maeda et al.
patent: 6395850 (2002-05-01), Charmot et al.
patent: 6423463 (2002-07-01), Oota et al.
patent: 6440636 (2002-08-01), Ushirogouchi et al.
patent: 6465150 (2002-10-01), Numata et al.
patent: 6468712 (2002-10-01), Fedynyshyn
patent: 6479210 (2002-11-01), Kinoshita et al.
patent: 6492086 (2002-12-01), Barclay et al.
patent: 6512021 (2003-01-01), Sugili et al.
patent: 6512081 (2003-01-01), Rizzardo et al.
patent: 6517990 (2003-02-01), Choi et al.
patent: 6517991 (2003-02-01), Kodama et al.
patent: 6517993 (2003-02-01), Nakamura et al.
patent: 6517994 (2003-02-01), Watanabe
patent: 6518364 (2003-02-01), Charmot et al.
patent: 6544715 (2003-04-01), Sato et al.
patent: 6548221 (2003-04-01), Uetani et al.
patent: 6559337 (2003-05-01), Maeda et al.
patent: 6569971 (2003-05-01), Roh et al.
patent: 6596458 (2003-07-01), Sato et al.
patent: 6962961 (2005-11-01), Lai
patent: 2001/0044070 (2001-11-01), Uetani et al.
patent: 2003/0180662 (2003-09-01), Nakano
patent: 2003/0232938 (2003-12-01), Charmot et al.
patent: 2004/0248031 (2004-12-01), Ansai et al.
patent: 0 349 232 (1990-01-01), None
patent: 0 421 149 (1991-04-01), None
patent: 0 449 619 (1991-10-01), None
patent: 1 182 506 (2002-02-01), None
patent: 2001-274195 (2003-03-01), None
patent: WO 98/01478 (1997-01-01), None
patent: WO 98/58974 (1998-12-01), None
patent: WO 99/05099 (1999-02-01), None
patent: WO 99/31144 (1999-06-01), None
patent: WO 99/35177 (1999-07-01), None
patent: WO 99/51980 (1999-10-01), None
patent: WO 00/75207 (2000-12-01), None
patent: WO 02/090397 (2002-11-01), None
patent: WO 02/090409 (2002-11-01), None
Afferent Systems, Inc., Afferent Analytical TM, Copyright 1996-1999, 1 pg., http://www.afference.com/analytical.html., Jul. 3, 1999.
Cargill et al., LRA, 8 (1996), vol. 6, pp. 139-148, “Automated Combinatorial Chemistry on Soild Phase”.
Castro et al., J. Org. Chem vol. 49 (1984): 863-866 “Kinetics and Mechanism of the Additional of Amines to Carbon Disulfide in Ethanol”.
Corkan et al., Chemometrics and Intelligent Laboratory Systems: Laboratory Information Management 17 (1992) 47-74, “Experiment Manager Software for an Automated Chemistry Workstation, Including a Scheduler for Parallel Experimentation”.
Grigoriadis et al., Application Note, pp. 50-51, Apr. 1997, “A Relational System for Managing High-Throughput Screening Data”.
McFarland et al., Mat Tech 1998 13.3:107-120, 1998 Matrice Technology Ltd., pp. 107-115, “Approaches for Rapid Materials Discovery Using Combinatorial Methods”.
MDL Information, Systems, Inc., Product News, 1998, pp. 1-8, “MDL Screen 1.3 Closes Final Group in HTS Workflow”.
Otsu et al., 1998, Advances in Polymer Science, vol. 136, pp. 75-137 “Controlled Synthesis of Polymers Using the Iniferter Technique: Developments in Living Radical Polymerization”.
Thayer, Business, 78(6), Chemical and Engineering News, Copyright 2000 American Chemical Society, http://pubs.acs.org/hotartcl/cenear/000207/7806bus1.html 13 pgs. “Bionformatics for the Masses”.
Network Science, Nov. 15, 2002, “Introducing MDL Screen,”.
Maeda Katsumi et al., “ArF Chemically Amplified Positive Resist Based on Alicyclic Lactone Polymer”, Publication Office Japanese Journal of Applied Physics, Tokyo, Japan, vol. 40, No. 12, Part 1, Dec. 2001, pp. 7162-7165, XP001093248, ISSN: 0021-4922.
Etsuo Hasegawa, Katsumi Maeda and Shigeyuki Iwasa, “Molecular design and development of photoresists for ArF excimer laser lithography”, Polymers for Advanced Technologies, vol. 11, 2000, pp. 560-569, XP002304945.
Robert D. Allen et al., “Protecting Groups for 193-nm Photoresists”, Proceedings of the SPIE, Bellingham, Virginia, US, vol. 2724, 1996, pp. 334-343, XP000912221, ISSN: 0277-786X.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Synthesis of photoresist polymers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Synthesis of photoresist polymers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Synthesis of photoresist polymers will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3790400

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.