Coater having substrate cleaning device and coating...

Details Coater having substrate cleaning device and coating... Coater having substrate cleaning device and coating...

2007-09-04

2007-09-04

Moore, Karla (Department: 1763)

Etching a substrate: processes

Etching and coating occur in the same processing chamber

C216S066000, C156S345310, C156S345390, C204S192110, C204S192340, C204S298040, C204S298250, C204S298260, C204S298350, C204S298360, C427S255500, C427S532000, C427S533000, C427S209000, C427S210000

Reexamination Certificate

active

10750337

ABSTRACT:
A coater having a substrate cleaning device is disclosed. Also disclosed are methods of processing substrates in a coater equipped with a substrate cleaning device. The substrate cleaning device comprises an ion gun (i.e., an ion source) that is positioned beneath a path of substrate travel (e.g., beneath a substrate support) extending through the coater and that is adapted for treating a bottom major surface of a substrate. Certain embodiments involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device. In some embodiments of this nature, the upward coating apparatus is configured for depositing a photocatalytic coating upwardly onto the bottom major surface of the substrate. Certain embodiments of the invention involve a downward coating apparatus, wherein the substrate cleaning device is further along the path of substrate travel than the downward coating apparatus. Some embodiments of this nature also involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device.

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Keem, Dr. John “Deposition and Surface Modification With Anode Layer Ion Sources”Veeco Instruments and Society of Vacuum Cleaners(PSE Presentation, (Sep. 11, 2002).
Blacker, Richard, et al. “Ion Bean Precleaning of Glass with ALS”Veeco Instruments 4thInternational Conference of Coatings on Glass Presentation(Nov. 2002).

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