Silsesquioxane compound mixture, method of making, resist...

Organic compounds -- part of the class 532-570 series – Organic compounds – Silicon containing

Reexamination Certificate

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C430S270100

Reexamination Certificate

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11393911

ABSTRACT:
A silsesquioxane compound mixture having a high proportion of silsesquioxane compounds bearing bulky substituent groups on side chain and having a degree of condensation of substantially 100% is prepared by a first stage wherein a silane feed comprising a trifunctional silane bearing a bulky substituent group on side chain represented by formula (1):wherein Y is an aliphatic or aromatic organic group optionally having a functional group, X1, X2and X3are H, halogen, alkoxy or aryloxy is hydrolyzed in the presence of an acid or base catalyst, and a second stage wherein dehydrating condensation is carried out in the presence of a strong base catalyst while removing the water resulting from condensation out of the reaction system.

REFERENCES:
patent: 4130599 (1978-12-01), Merrill et al.
patent: 5714625 (1998-02-01), Hada et al.
patent: 6063953 (2000-05-01), Hada et al.
patent: 6261738 (2001-07-01), Asakura et al.
patent: 6972312 (2005-12-01), Lichtenhan et al.
patent: 2004/0137241 (2004-07-01), Lin et al.
patent: 2001/0241579 (2004-12-01), Hamada et al.
patent: 2004/0241579 (2004-12-01), Hamada et al.
patent: 9-95479 (1997-04-01), None
patent: 9-208554 (1997-08-01), None
patent: 9-230588 (1997-09-01), None
patent: 9-301948 (1997-11-01), None
patent: 29006999 (1999-06-01), None
patent: 2000-314956 (2000-11-01), None
patent: 2003-510337 (2003-03-01), None
patent: 2004-212983 (2004-07-01), None
patent: 2004-354417 (2004-12-01), None
patent: WO 01/10871 (2001-02-01), None
patent: WO 01/46295 (2001-06-01), None
European Search Report dated Aug. 23, 2006, issued in the corresponding European Application No. 06251845.1.
K. Arimitsu et al.; “Sensitivity Enhancement of Chemical-Amplification-Type Photoimaging Materials by Acetoacetic Acid Derivatives”; Journal of Photopolymer Science and Technology, vol. 8, No. 1, 1995; pp. 43-44.
K. Kudo et al.; “Enhancement of the Senesitivity of Chemical-Ampliciation-Type Photoimaging Materials by β-Tosyloxyketone Acetals”; Journal of Photopolymer Science and Techonology, vol. 8, No. 1, 1995; pp. 45-46.
K. Arimitsu et al.; “Effect of Phenolic Hydroxyl Residues on the Improvement of Acid-Proliferation-Type Photoimaging materials”; Journal of Photopolymer Science and Techonology, vol. 9, No. 1, 1996; pp. 29-30.

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