Lithography apparatus and method for measuring alignment mark

Details Lithography apparatus and method for measuring alignment mark Lithography apparatus and method for measuring alignment mark

2007-03-20

2007-03-20

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S055000

Reexamination Certificate

active

11024743

ABSTRACT:
A lithographic exposing system having an optical system including a light source, a lens, a mirror and a filter, and transferring patterns formed on a reticle to a substrate. The method includes a device for lowering the energy of the light from the light source below a threshold energy, an equipment for making the light that has passed through the device a light source for measuring alignment marks formed on the substrate, and a light path controlling device for directing the light from the light source toward the optical system in an exposing process and for making the light from the light source toward said the alignment mark measuring equipment.

REFERENCES:
patent: 5936253 (1999-08-01), Sugaya
patent: 6151121 (2000-11-01), Mishima
patent: 6219130 (2001-04-01), Kawakubo
patent: 6304319 (2001-10-01), Mizutani

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