Polymers, resist compositions and patterning process

Details Polymers, resist compositions and patterning process Polymers, resist compositions and patterning process

2007-01-30

2007-01-30

Pezzuto, Helen L. (Department: 1713)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S243000, C526S244000, C526S251000, C526S281000

Reexamination Certificate

active

11179606

ABSTRACT:
A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 5310619 (1994-05-01), Crivello et al.
patent: 6576392 (2003-06-01), Sato et al.
patent: 63-27829 (1988-02-01), None
patent: 2-27660 (1990-06-01), None
patent: 5-158239 (1993-06-01), None
patent: 5-232706 (1993-09-01), None
patent: 5-249662 (1993-09-01), None
patent: 5-249683 (1993-09-01), None
patent: 5-257282 (1993-10-01), None
patent: 5-289322 (1993-11-01), None
patent: 5-289340 (1993-11-01), None
patent: 6-11837 (1994-01-01), None
patent: 9-73173 (1997-03-01), None
patent: 9-197661 (1997-07-01), None
patent: 9-230595 (1997-09-01), None
patent: 10-10739 (1998-01-01), None
patent: 11-327145 (1999-11-01), None
patent: 11-338150 (1999-12-01), None
patent: 2000-47385 (2000-02-01), None
patent: 2000-275841 (2000-06-01), None
patent: 2000-275838 (2000-10-01), None
patent: 2000-275840 (2000-10-01), None
patent: WO-97/33198 (1997-09-01), None
Shirai et al., Journal of Photopolymer Science and Technology, vol. 11, No. 4, pp. 641-644 (1998).
Fujigaya et al., Journal of Photopolymer Science and Technology, vol. 15, No. 4, pp. 643-654 (2002).

Affiliated with

Also associated with

Rating

Polymers, resist compositions and patterning process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polymers, resist compositions and patterning process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polymers, resist compositions and patterning process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3776647