Gas injection device

Fluid handling – Diverse fluid containing pressure systems – Fluid separating traps or vents

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C137S177000, C137S187000, C055S430000, C055S432000

Reexamination Certificate

active

11214112

ABSTRACT:
The subject invention is related to a gas injection device with back-flow leaking liquid discharge, comprising a chamber, a gas inlet conduit, a gas outlet conduit, and a liquid discharging conduit, wherein the gas outlet conduit and the liquid discharging conduit are provided with a check valve, respectively. When a gas is passed to the chamber through the gas inlet conduit, the check valve of the gas outlet conduit is open for the gas to be passed into a liquid and the check valve of the liquid discharging conduit is closed. While the gas has stopped injecting into the liquid, the check valve of the gas outlet is closed to prevent the liquid from back flow. The small amount of back-flow leaking liquid accumulated in the chamber can open the check valve of the liquid discharging conduit to discharge the leaking liquid from the chamber.

REFERENCES:
patent: 407224 (1889-07-01), Leleand
patent: 522573 (1894-07-01), Burrows
patent: 531139 (1894-12-01), Smith et al.
patent: 555701 (1896-03-01), Howell
patent: 578873 (1897-03-01), Hermansader et al.
patent: 689366 (1901-12-01), Newbold et al.
patent: 990735 (1911-04-01), Heffernan et al.
patent: 1117547 (1914-11-01), Beulke
patent: 1130349 (1915-03-01), Templeton
patent: 2037245 (1936-04-01), Leifheit et al.
patent: 2705545 (1955-04-01), Gothberg
patent: 2709679 (1955-05-01), Andrus
patent: 2737364 (1956-03-01), Handwerk
patent: 2959185 (1960-11-01), Deutsch
patent: 3841064 (1974-10-01), Hitchiner et al.
patent: 3890122 (1975-06-01), Frantz
patent: 5022114 (1991-06-01), Kauffeldt et al.
patent: 6026842 (2000-02-01), Gallant
patent: 6513187 (2003-02-01), Naseth, Sr.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Gas injection device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas injection device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas injection device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3775447

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.