Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2007-05-22

2007-05-22

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S069000

Reexamination Certificate

active

10842634

ABSTRACT:
A lithographic apparatus includes an instrument for determining the radiation intensity distribution at a pupil plane of the projection system while a patterning device is imparting the projection beam with a pattern, a calculation apparatus for calculating the effect on the imaging by the projection system of heating resulting from the projection beam in the projection system having the determined intensity distribution and a controller for adjusting the lithographic apparatus to compensate for the calculated effect of heating.

REFERENCES:
patent: 4666273 (1987-05-01), Shimizu et al.
patent: 5661546 (1997-08-01), Taniguchi
patent: 5677757 (1997-10-01), Taniguchi et al.
patent: 6040894 (2000-03-01), Takahashi
patent: 6078380 (2000-06-01), Taniguchi et al.
patent: 6414743 (2002-07-01), Nishi et al.
patent: 6549266 (2003-04-01), Taniguchi

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