Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2007-07-24
2007-07-24
Bella, Matthew C. (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S170000, C382S172000, C356S237400, C356S237500
Reexamination Certificate
active
10691904
ABSTRACT:
A pattern inspection method and apparatus, wherein the target area is limited to a line part, having a simplified configuration and capable of detecting a killer defect as a defect candidate and considerably reducing the number of non-killer defects to be detected as defect candidates, have been disclosed. The present invention relates to a pattern inspection method and apparatus for judging non-matching parts to be defects by making a comparison between the same patterns having a line part in which a line extending in the longitudinal or transverse direction appears repetitively at a fixed pitch, wherein an average level of gray level data is calculated for each pixel columns in the direction in which the line extends, a type of the area of each pixel columns is classified into groups, a threshold value is determined for each area according to the statistical processing result of the type and the difference data of each pixel column, and the difference data is judged based on the threshold value.
REFERENCES:
patent: 5091963 (1992-02-01), Litt et al.
patent: 6229331 (2001-05-01), Kuwabara
patent: 2002/0146171 (2002-10-01), Chandrasekhar
patent: 4-107946 (1992-04-01), None
patent: 5-47886 (1993-02-01), None
patent: 11-135583 (1999-05-01), None
patent: 2000-171404 (2000-06-01), None
patent: 2002-22421 (2002-01-01), None
Patent Abstract of Japan, Publication No. 04107946 A, Published on Apr. 9, 1992, in the name of Taniguchi et al.
Patent Abstract of Japan, Publication No. 05047886 A, Published on Feb. 26, 1993, in the name of Jingu.
Patent Abstract of Japan, Publication No. 2002022421 A, Published on Jan. 23, 2002, in the name of Hikita et al.
Patent Abstracts of Japan, Publication No. 11-135583, dated May 21, 1999, in the name of Yasuhiko Nakayama et al.
Bella Matthew C.
Christie Parker & Hale LLP
Cunningham G. F.
Tokyo Seimitsu Co., Ltd
LandOfFree
Pattern inspection method and inspection apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pattern inspection method and inspection apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern inspection method and inspection apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3770114