Thin-film deposition apparatus

Details Thin-film deposition apparatus Thin-film deposition apparatus

2007-09-11

2007-09-11

Moore, Karla (Department: 1763)

Coating apparatus

Gas or vapor deposition

Multizone chamber

C118S729000, C118S733000, C156S345310, C156S345540, C204S298230, C204S298250

Reexamination Certificate

active

10841794

ABSTRACT:
A thin-film deposition apparatus includes a reaction chamber, a substrate transfer chamber, a susceptor having a radially-extending step portion, a ring-shaped separation wall for separating the reaction chamber and the substrate transfer chamber at a processing position where the susceptor is positioned inside the ring-shaped separation wall, and a conductive sealing member which is interposed between the radially-extending step portion and the separation wall to seal the reaction chamber from the substrate transfer chamber when the susceptor is at a processing position.

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patent: 2002-353207 (2002-12-01), None
patent: 2003-163208 (2003-06-01), None

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