Method for determining an edge profile of a volume of a...

Details Method for determining an edge profile of a volume of a... Method for determining an edge profile of a volume of a...

2007-09-18

2007-09-18

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S322000, C430S330000, C430S331000

Reexamination Certificate

active

11371237

ABSTRACT:
The present invention relates to a method for determining an edge profile of a volume of a photoresist after a development process. At first, the volume of the photoresist is divided into cells. A chemical master equation is set up which reflects the stochastic kinetics of chemical reactions proceeding in cells of the volume of the photoresist during the development process. The chemical master equation is solved for a given development time on the basis of a Gillespie algorithm in order to determine developed and non-developed cells of the volume of the photoresist at the end of the development process. Finally, the edge profile of the volume of the photoresist after the development process is determined on the basis of a cluster of non-developed cells.

REFERENCES:
patent: 5446870 (1995-08-01), Hinsberg
Burns, S. D. et al. (2002). “Advancements to the Critical Ionization Dissolution Model,”J. Vac. Sci. Technol. B20(2):537-543.
Gillespie, D. T. (1976). “A General Method for Numerically Simulating the Stochastic Time Evolution of Coupled Chemical Reactions,”Journal of Computational Physics22:403-434.
Houle, F. A. et al. (2002). “Kinetic Model for Positive Tone Resist Dissolution and Roughening,”Macromolecules35:8591-8600.

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