Phase-shifting test mask patterns for characterizing...

Details Phase-shifting test mask patterns for characterizing... Phase-shifting test mask patterns for characterizing...

2007-05-29

2007-05-29

Nguyen, Tu T. (Department: 2877)

Optics: measuring and testing

By polarized light examination

Reexamination Certificate

active

11357803

ABSTRACT:
A method to monitor the state of polarization incident on a photomask in projection printing is presented. The method includes a series of phase-shifting mask patterns that take advantage of high NA effects to create a signal dependent on only one incident polarization component. The patterns include in two embodiments a Radial Phase Grating (RPG) and Proximity Effect Polarization Analyzers (PEPA). A test reticle design includes multiple polarimeters with an array of pinholes on the backside of the photomask. This technique is able to monitor any arbitrary illumination scheme for a particular tool.

REFERENCES:
patent: 5661560 (1997-08-01), Ozaki
patent: 5764363 (1998-06-01), Ooki et al.
McIntyre and Neureuther, “Characterizing Illumination Angular Uniformity with Phase-Shifting Masks”, Optical Microlithography XVI. Edited by Yen, Anthony. Proceedings of the SPIE, vol. 5040, pp. 162-170 (Feb. 25, 2003).
McIntyre and Neureuther, “Interferometric-Probe Monitors for Self-Diagnostics of Phase-Shifting Mask Performance”, 23rd Annual BACUS Symposium on Photomask Technology. Edited by Kimmel, Kurt R.; Staud, Wolfgang. Proceedings of the SPIE, vol. 5256, pp. 1324-1330 (Sep. 9, 2003).
McIntyre and Neureuther, “Linear Phase Ring Illuminator Monitor”, J. Vac. Sci. Tech, May 28, 2003.
Van Den Broeke, “Transferring Phase-Shifting Mask Technology into Mainstream Manufacturing”, Downloaded from: http://www.semiconductorfabtech.com/features/lithography/articles/body5.225.php3 on Oct. 22, 2004, 7 pages.
McIntyre and Neureuther, “Monitoring Polarization and High-Numerical Aperatyre with Phase Shifting Masks: Radial Phase Grading,” J. Vac. Sci. Technol. B 23(1), Jan./Feb. 2005.
McIntyre and Neureuther, “Phase-shifting Mask Polarimetry: Monitoring Polarization at 193-nm High Numerical Aperature and Immersion Lithography with Pahse Shifting Masks,” J. Mictolith., Microfab., Microsyst., 4(3), 031102 (Jul.- Sep. 2005).
U.S. Appl. No. 11/053,725, filed Feb. 7, 2005.

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