Exposure method

Details Exposure method Exposure method

2007-05-29

2007-05-29

Matthews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000, C355S077000

Reexamination Certificate

active

11252440

ABSTRACT:
An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto an object to be exposed, via a liquid that is filled in a space between said projection optical system and the object, and a removing part for removing an air bubble and/or a foreign particle mixed in the liquid by forming a predetermined flow velocity distribution in the liquid.

REFERENCES:
patent: 2005/0037269 (2005-02-01), Levinson
patent: 2006/0126043 (2006-06-01), Mizutani et al.
patent: 6-124873 (1994-05-01), None
patent: 99/49504 (1999-09-01), None
patent: WO 2004/053958 (2004-06-01), None
English Translation of WO 99/49504.
English Translation of JP 6-124873.
English Translation of WO 99/49504 (publication date Sep. 30, 1999).
English Translation of JP 6-124873 (publication date May 1994).
Bruce Smith, “Extreme-NA Water Immersion Lithography for 35-65 nm Technology”, International Symposium on 157 nm Lithography, Sep. 3-6, 2002, Belgium.

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