Semiconductor device having a roughened surface

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – With textured surface

Reexamination Certificate

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Details

C257S781000

Reexamination Certificate

active

10318199

ABSTRACT:
An oxide film formed on the surface of copper film of an electrode pad is cleaned by oxalic acid after unevenness is formed on the surface of copper film by treating the surface with organic acid. Thereby, stable resistance is obtained when carrying out a characteristic inspection by bringing a probe into contact with the electrode pad, and it is easily recognized by observation through a microscope that the probe is brought into contact with the electrode pad. In addition, wettability with respect to solder is satisfactory, and it is possible to favorably form a solder bump on the electrode pad.

REFERENCES:
patent: 5487999 (1996-01-01), Farnworth
patent: 5545589 (1996-08-01), Tomura et al.
patent: 5693565 (1997-12-01), Camilletti et al.
patent: 5723822 (1998-03-01), Lien
patent: 6005290 (1999-12-01), Akram et al.
patent: 6242813 (2001-06-01), Huang et al.
patent: 6560862 (2003-05-01), Chen et al.
patent: 6700198 (2004-03-01), Toya et al.
patent: 01-189153 (1989-07-01), None
patent: 01-283841 (1989-11-01), None
patent: 03-246945 (1991-05-01), None
patent: 8-064633 (1996-03-01), None
patent: 8-139433 (1996-05-01), None
patent: 9-115971 (1997-05-01), None
patent: 10-189671 (1998-07-01), None
patent: 2001-174514 (2001-06-01), None
patent: 2001-203205 (2001-07-01), None
patent: 2001-267356 (2001-09-01), None
patent: WO 00/59029 (2000-10-01), None

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