Laser-irradiated thin films having variable thickness

Details Laser-irradiated thin films having variable thickness Laser-irradiated thin films having variable thickness

2007-01-16

2007-01-16

Smith, Zandra V. (Department: 2822)

Active solid-state devices (e.g., transistors, solid-state diode

Non-single crystal, or recrystallized, semiconductor...

Non-single crystal, or recrystallized, material with...

C257S066000, C257S070000, C257S072000

Reexamination Certificate

active

10754157

ABSTRACT:
A crystalline film includes a first crystalline region having a first film thickness and a first crystalline grain structure; and a second crystalline region having a second film thickness and a second crystalline grain structure. The first film thickness is greater than the second film thickness and the first and second film thicknesses are selected to provide a crystalline region having the degree and orientation of crystallization that is desired for a device component.

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