Method of fabricating an array substrate

Details Method of fabricating an array substrate Method of fabricating an array substrate

2007-05-29

2007-05-29

Smith, Matthew (Department: 2823)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S474000, C349S139000, C349S143000

Reexamination Certificate

active

09793103

ABSTRACT:
An array substrate for use in an X-ray sensing device and in an LCD device is fabricated using plasma gas treatment. Especially, an indium-tin-oxide (ITO) transparent conductive metallic layer is plasma-treated by N2plasma, He plasma or Ar plasma, before forming the insulation layer on the ITO transparent conductive metallic layer. Thus, the plasma removes the impurities on a surface of the transparent conductive metallic layer and changes the lattice structure of the surface of the transparent conductive metallic layer, and thus the adhesion between the transparent conductive metallic layer and the insulation layer is improved. The defects caused by a gap or a space between the transparent conductive metallic layer and the insulation layer do not occur.

REFERENCES:
patent: 5171401 (1992-12-01), Roselle
patent: 5529720 (1996-06-01), Hayashi et al.
patent: 5701168 (1997-12-01), Patel
patent: 5779802 (1998-07-01), Borghs et al.
patent: 6038008 (2000-03-01), Kim et al.
patent: 6060826 (2000-05-01), Ueda et al.
patent: 6118218 (2000-09-01), Yializis et al.
patent: 6124517 (2000-09-01), Kaminsky et al.
patent: 6188176 (2001-02-01), Nakaya et al.
patent: 6188452 (2001-02-01), Kim et al.
patent: 6259202 (2001-07-01), Sturm et al.
patent: 6281525 (2001-08-01), Krijn et al.
patent: 6300152 (2001-10-01), Kim
patent: 6556257 (2003-04-01), Ino
patent: 2004/0201048 (2004-10-01), Seki et al.
patent: 62-051264 (1987-03-01), None
Derwent-ACC-No.: 2001-600582 “Method for forming pixel electrode of liquid crystal display device”, Hwang, G J, LG Philips LCD CO LTD [GLDS].

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