Wafer cell for immersion lithography

Details Wafer cell for immersion lithography Wafer cell for immersion lithography

2007-09-18

2007-09-18

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for photosensitive paper

C355S030000

Reexamination Certificate

active

10829623

ABSTRACT:
An apparatus, system and method for use with a photolithographic system. In accordance with one embodiment, the photolithographic system of the present invention includes a workpiece support member for supporting a semiconductor wafer. A substantially transparent cover member is disposed over the workpiece support member to form a substantially enclosed workpiece cell therebetween. The enclosed workpiece cell is filled with a first immersion fluid having suitable refractive properties. The cover member, having suitable refractive properties, includes an upper surface contoured to form an open reservoir containing a second immersion fluid, having suitable refractive properties, and in which a final lens element may be immersed during a lithography process.

REFERENCES:
patent: 6954256 (2005-10-01), Flagello et al.
patent: 7009682 (2006-03-01), Bleeker
patent: 221563 (1985-04-01), None
patent: 224448 (1985-07-01), None

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