Optical glass suffering little change in refractive index by...

Compositions: ceramic – Ceramic compositions – Glass compositions – compositions containing glass other than...

Reexamination Certificate

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C501S058000, C501S059000, C501S060000, C501S061000, C501S065000, C501S066000, C501S069000, C430S004000

Reexamination Certificate

active

09872842

ABSTRACT:
An optical glass wherein an amount of change in refractive index (Δn: difference in refractive index between a state before radiation and a state after radiation) caused by radiation of laser beam at wavelength of 351 nm having average output power of 0.43 W, pulse repetition rate of 5 kHz and pulse width of 400 ns for one hour is 5 ppm or below is provided. The optical glass comprises a fluorine ingredient and/or a titanium oxide ingredient and/or an arsenic oxide ingredient. The optical glass suffers little change in refractive index by radiation of strong light having wavelengths of 300 nm to 400 nm such as ultraviolet laser.

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Westerhoff T et al., “Optical materials for microlithograph applications”, Inorganic Optical Materials, San Diego CA, USA, Jul. 19-20, 1998, vol. 3424, pp. 10-19, The International Society for Optical Engineering, *p. 10 paragraph 1-p. 13, paragraph 1*.

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