In-line heater for use in semiconductor wet chemical...

Details In-line heater for use in semiconductor wet chemical... In-line heater for use in semiconductor wet chemical...

2007-01-16

2007-01-16

Evans, Robin (Department: 3742)

Electric heating

Heating devices

With heating unit structure

C219S548000, C219S552000

Reexamination Certificate

active

10867108

ABSTRACT:
An in-line heater for use in semiconductor wet chemical processing comprises a single crystal alumina substrate, a resistive heating element disposed on the single crystal alumina substrate, and a protective layer disposed over the resistive heating element. The single crystal alumina substrate has a moderate coefficient of thermal expansion (CTE) that is substantially equivalent to the CTEs of the resistive heating element and the protective layer. Therefore, cracking between the substrate and the protective layer can be minimized. The in-line heater in accordance with this invention exhibits an excellent corrosion-resistance capability even at high temperature and can carry a wide variety of corrosive chemicals including hydrofluoride solution.

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