Thermal development system and method of using the same

Details Thermal development system and method of using the same Thermal development system and method of using the same

2007-04-10

2007-04-10

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Transfer procedure between image and image layer, image...

Image layer portion transfer and element therefor

C430S306000, C430S330000, C156S234000, C156S540000, C156S552000, C156S583500, C156S583200, C156S499000

Reexamination Certificate

active

11159704

ABSTRACT:
An improved apparatus and a method of using the apparatus to remove non-crosslinked photopolymer from an imaged and exposed surface of a relief image printing element. Included are means for supporting and rotating the printing element, means for softening and/or melting non-crosslinked photopolymer on the imaged and exposed surface of the printing element, and at least one thermal developing assembly. The thermal developing assembly includes means for supplying an absorbent material that is contactable with the printing element, and that is capable of removing at least a portion of the softened and/or melted non-crosslinked photopolymer, and means for causing the absorbent material to contact at least a portion of the printing element. The absorbent material is backed with an endless impression belt that is supported by a plurality of rollers. When the absorbent material contacts the surface of the printing element, softened and/or melted non-crosslinked photopolymer on the surface of the printing element is removed.

REFERENCES:
patent: 3264103 (1966-08-01), Cohen et al.
patent: 5003873 (1991-04-01), Lauber
patent: 5175072 (1992-12-01), Martens
patent: 5262275 (1993-11-01), Fan
patent: 5279697 (1994-01-01), Peterson et al.
patent: 5925500 (1999-07-01), Yang et al.
patent: 6238837 (2001-05-01), Fan
patent: 6797454 (2004-09-01), Johnson et al.
patent: 2002/0164494 (2002-11-01), Grant et al.
patent: 2003/0180655 (2003-09-01), Fan et al.
patent: 2003/0211423 (2003-11-01), Mengel et al.
patent: 2005/0084791 (2005-04-01), Hackler et al.
patent: 2006/0029880 (2006-02-01), McMillen et al.
patent: 1 239 329 (2002-09-01), None
patent: WO 01/18604 (2001-03-01), None
patent: WO 01/88615 (2001-11-01), None

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