Semiconductor etching paste and the use thereof for...

Details Semiconductor etching paste and the use thereof for... Semiconductor etching paste and the use thereof for...

2007-03-27

2007-03-27

Vinh, Lan (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C438S750000, C252S079100

Reexamination Certificate

active

10609015

ABSTRACT:
A method of etching a semiconductor substrate is described, the method comprising the steps of applying a paste containing an etchant to the substrate, and carrying out a thermal processing step to etch a part or a layer of the substrate where the paste has been applied. The etchant paste is preferably a caustic etching paste. The etchant paste may be applied selectively to a major surface of the substrate to form a pattern of applied paste. For example, the paste may be applied by a printing method, such as screen-printing. The method may be used to produce solar cells.

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