Charged beam writing apparatus and writing method

Details Charged beam writing apparatus and writing method Charged beam writing apparatus and writing method

2006-10-10

2006-10-10

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492300, C250S492230

Reexamination Certificate

active

07119348

ABSTRACT:
A charged beam writing apparatus is disclosed, which comprises a shaped beam forming unit which shapes a charged beam radiated from a charged beam source into a beam of a desired shape by using at least two shaping masks each having a shaping aperture to form a shaped beam, a figure dividing unit which divides a contour portion of a pattern to be formed on an object layer into a plurality of figure portions having a predetermined area, a writing unit which writes the figure portions of the contour portion by using a shaped beam of the predetermined area, and a focus control unit which performs focusing of the beam radiated from the charged beam source, by using a shaped beam having the same area as that of the shaped beam which has the predetermined area and is used in writing of the figure portions of the contour portion.

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