Active rinse shield for electrofill chemical bath and method...

Details Active rinse shield for electrofill chemical bath and method... Active rinse shield for electrofill chemical bath and method...

2006-12-12

2006-12-12

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

With non-impelling fluid deflector or baffle other than...

C134S143000, C134S200000, C134S902000, C049S042000, C049S044000, C049S045000, C049S046000

Reexamination Certificate

active

07146994

ABSTRACT:
An active rinse shield designed to protect electrofill chemical baths from excessive dilution during rinse sprays on the semiconductor wafer. The shield uses overlapping blades to cover the bath, making a physical barrier between the bath chemistry and the wafer rinse water. The blades are interconnecting ribs that actuate around a common pivot axis. A linear mechanical actuator controls the blade movement, moving the top-most blade, which in turn, moves an adjacent lower blade. Each upper blade is interconnected to an adjacent lower blade by upper and lower ledges, a pivot boss and interlocking cut, and a curved ledge on each blade's body surface. The interconnecting features allow the blades to move one another out for extension or in for retraction. The interlocking blades are inclined above one another, forming grooves to redirect the rinse water away from the chemical bath.

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