Abrading – Machine – Rotary tool
Reexamination Certificate
2006-06-20
2006-06-20
Rachuba, M. (Department: 3723)
Abrading
Machine
Rotary tool
C451S287000, C451S443000, C451S444000
Reexamination Certificate
active
07063603
ABSTRACT:
A method and apparatus for cleaning a web-based chemical-mechanical planarization (CMP) system. Specifically, a fluid spray bar is coupled to a frame assembly which may be mounted on a CMP system. The fluid spray bar will move along the frame assembly. As the fluid spray bar traverses the length of the frame assembly, a cleaning fluid is sprayed onto the web in order to clean the web between planarization cycles.
REFERENCES:
patent: 3604434 (1971-09-01), Hurst
patent: 4150512 (1979-04-01), Novak
patent: 4525955 (1985-07-01), Cothrell et al.
patent: 5738574 (1998-04-01), Tolles et al.
patent: 6102782 (2000-08-01), Custer et al.
patent: 6139402 (2000-10-01), Moore
patent: 6146246 (2000-11-01), Custer et al.
patent: 6152808 (2000-11-01), Moore
patent: 6187681 (2001-02-01), Moore
patent: 6193588 (2001-02-01), Carlson et al.
patent: 6196899 (2001-03-01), Chopra et al.
patent: 6244935 (2001-06-01), Birang et al.
patent: 6261163 (2001-07-01), Walker et al.
patent: 6273796 (2001-08-01), Moore
patent: 6306014 (2001-10-01), Walker et al.
patent: 6354930 (2002-03-01), Moore
patent: 6358127 (2002-03-01), Carlson et al.
patent: 6361411 (2002-03-01), Chopra et al.
patent: 6364757 (2002-04-01), Moore
patent: 6368193 (2002-04-01), Carlson et al.
patent: 6390910 (2002-05-01), Moore
patent: 6394883 (2002-05-01), Carlson et al.
patent: 6402601 (2002-06-01), Walker et al.
patent: 6419560 (2002-07-01), Walker et al.
patent: 6425802 (2002-07-01), Custer et al.
patent: 6428404 (2002-08-01), Walker et al.
patent: 6447369 (2002-09-01), Moore
patent: 6669538 (2003-12-01), Li et al.
patent: 2001/0029155 (2001-10-01), Bennett et al.
patent: 2002/0100743 (2002-08-01), Bonner et al.
Chopra Dinesh
Moore Scott E.
Fletcher Yoder
Micro)n Technology, Inc.
Rachuba M.
LandOfFree
Method and apparatus for cleaning a web-based chemical... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for cleaning a web-based chemical..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for cleaning a web-based chemical... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3708364