Inert-gas purge method, exposure apparatus, device...

Details Inert-gas purge method, exposure apparatus, device... Inert-gas purge method, exposure apparatus, device...

2006-10-31

2006-10-31

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S077000

Reexamination Certificate

active

07130015

ABSTRACT:
An exposure apparatus for exposing a substrate to light from a light source via a reticle. The apparatus includes an optical system configured to introduce the light via the reticle to the substrate, a chamber configured to house at least a part of the optical system, a supply system configured to supply inert gas into the chamber at a variable supply flow rate, an exhaust system configured to exhaust gas from the chamber at a variable exhaust flow rate, and a controller configured to control the supply system so as to reduce the supply flow rate, and configured to control the exhaust system so as to reduce the exhaust flow rate prior to the reduction of the supply flow rate.

REFERENCES:
patent: 6914667 (2005-07-01), Yamamoto
patent: 2002/0000519 (2002-01-01), Tsukamoto
patent: 2002/0036760 (2002-03-01), Udagawa et al.
patent: 2005/0110968 (2005-05-01), Aichi et al.
patent: 6-216000 (1994-08-01), None

Affiliated with

Also associated with

Rating

Inert-gas purge method, exposure apparatus, device... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Inert-gas purge method, exposure apparatus, device..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inert-gas purge method, exposure apparatus, device... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3707763