Siloxane-based resin containing germanium and an interlayer...

Details Siloxane-based resin containing germanium and an interlayer... Siloxane-based resin containing germanium and an interlayer...

2006-06-06

2006-06-06

Moore, Margaret G. (Department: 1712)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

C428S447000

Reexamination Certificate

active

07057002

ABSTRACT:
A siloxane-based resin having germanium and an interlayer insulating film for a semiconductor device formed using the same. The siloxane-based resins have a low dielectric constant in addition to excellent mechanical properties so that they are useful materials for an insulating film between interconnecting layers of a semiconductor device.

REFERENCES:
patent: 3615272 (1971-10-01), Collins et al.
patent: 4399266 (1983-08-01), Matsumura et al.
patent: 4756977 (1988-07-01), Haluska et al.
patent: 5010159 (1991-04-01), Bank et al.
patent: 5853808 (1998-12-01), Arkles et al.
patent: 6000339 (1999-12-01), Matsuzawa
patent: 6395826 (2002-05-01), Mager et al.
patent: 0 997 497 (2000-05-01), None

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