Methods for reducing aberration in optical systems

Optical: systems and elements – Polarization without modulation – By relatively adjustable superimposed or in series polarizers

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C359S494010, C359S900000, C355S053000, C355S071000

Reexamination Certificate

active

06995908

ABSTRACT:
An optical system includes multiple cubic crystalline optical elements and one or more polarization rotators in which the crystal lattices of the cubic crystalline optical elements are oriented with respect to each other to reduce the effects of intrinsic birefringence and produce a system with reduced retardance. The optical system may be a refractive or catadioptric system having a high numerical aperture and using light with a wavelength at or below 248 nanometers. The net retardance of the system is less than the sum of the retardance contributions of the respective optical elements. In one embodiment, all cubic crystalline optical elements are oriented with identical three dimensional cubic crystalline lattice directions, a 90° polarization rotator divides the system into front and rear groups such that the net retardance of the front group is balanced by the net retardance of the rear group. The optical system may be used in a photolithography tool to pattern substrates such as semiconductor substrates and thereby produce semiconductor devices.

REFERENCES:
patent: 2777360 (1957-01-01), Blaisse
patent: 3052152 (1962-09-01), Koester
patent: 3644018 (1972-02-01), Pasold
patent: 3758201 (1973-09-01), MacNeille
patent: 4239329 (1980-12-01), Matsumoto
patent: 4534649 (1985-08-01), Downs
patent: 4576479 (1986-03-01), Downs
patent: 5033830 (1991-07-01), Jameson
patent: 5237445 (1993-08-01), Kuzuta
patent: 5410375 (1995-04-01), Fiala
patent: 5537260 (1996-07-01), Williamson
patent: 6081382 (2000-06-01), Omura
patent: 6084708 (2000-07-01), Schuster
patent: 6137626 (2000-10-01), Takaoka
patent: 6172380 (2001-01-01), Noguchi et al.
patent: 6195213 (2001-02-01), Omura et al.
patent: 6201634 (2001-03-01), Sakuma et al.
patent: 6252712 (2001-06-01), Fürter et al.
patent: 6259508 (2001-07-01), Shigematsu
patent: 6324003 (2001-11-01), Martin
patent: 6366404 (2002-04-01), Hiraiwa et al.
patent: 6411384 (2002-06-01), Sakuma et al.
patent: 6417974 (2002-07-01), Schuster
patent: 6455862 (2002-09-01), van der Veen et al.
patent: 6583931 (2003-06-01), Hiraiwa et al.
patent: 6672109 (2004-01-01), Hiraiwa
patent: 6683710 (2004-01-01), Hoffman et al.
patent: 6683729 (2004-01-01), Schuster
patent: 6697199 (2004-02-01), Gerhard et al.
patent: 6728043 (2004-04-01), Gruner et al.
patent: 6775063 (2004-08-01), Shiraishi
patent: 2001/0026006 (2001-10-01), Noble et al.
patent: 2002/0085176 (2002-07-01), Hiraiwa et al.
patent: 2002/0149855 (2002-10-01), Schuster
patent: 2002/0186355 (2002-12-01), Omura
patent: 2003/0000453 (2003-01-01), Unno et al.
patent: 2003/0007253 (2003-01-01), Schuster et al.
patent: 2003/0011893 (2003-01-01), Shiraishi et al.
patent: 2003/0012724 (2003-01-01), Burnett et al.
patent: 2003/0021026 (2003-01-01), Allan et al.
patent: 2003/0025894 (2003-02-01), Owa et al.
patent: 2003/0053036 (2003-03-01), Fujishima et al.
patent: 2003/0058421 (2003-03-01), Omura et al.
patent: 2003/0063393 (2003-04-01), Omura
patent: 2003/0067679 (2003-04-01), Allan et al.
patent: 2003/0086071 (2003-05-01), McGuire, Jr.
patent: 2003/0086156 (2003-05-01), McGuire, Jr.
patent: 2003/0086157 (2003-05-01), McGuire, Jr.
patent: 2003/0086171 (2003-05-01), McGuire
patent: 2003/0089299 (2003-05-01), Obara et al.
patent: 2003/0091934 (2003-05-01), Allan et al.
patent: 2003/0112501 (2003-06-01), Sakuma
patent: 2003/0128349 (2003-07-01), Unno
patent: 2003/0147061 (2003-08-01), Omura
patent: 2003/0168597 (2003-09-01), Webb et al.
patent: 2003/0197946 (2003-10-01), Omura
patent: 2003/0234981 (2003-12-01), Hoffman et al.
patent: 2004/0001244 (2004-01-01), Hoffman et al.
patent: 2004/0004757 (2004-01-01), Schuster
patent: 2004/0004771 (2004-01-01), Omura
patent: 2004/0005266 (2004-01-01), Sakuma et al.
patent: 2004/0036961 (2004-02-01), McGuire, Jr.
patent: 2004/0036971 (2004-02-01), McGuire, Jr.
patent: 2004/0036985 (2004-02-01), McGuire, Jr.
patent: 2004/0105170 (2004-06-01), Krahmer et al.
patent: 2004/0136084 (2004-07-01), Unno
patent: 101 23 725 (2002-11-01), None
patent: 101 23 727 (2002-11-01), None
patent: 101 27 320 (2002-12-01), None
patent: 101 25 487 (2003-01-01), None
patent: 102 10 782 (2003-10-01), None
patent: 0 828 172 (1998-03-01), None
patent: 1 063 684 (2000-12-01), None
patent: 1115019 (2001-07-01), None
patent: 1139138 (2001-10-01), None
patent: 09-146020 (1997-06-01), None
patent: 2000331927 (2000-11-01), None
patent: 2001-108801 (2001-04-01), None
patent: 2002-302628 (2002-10-01), None
patent: 2003-050349 (2003-02-01), None
patent: WO 01/01182 (2001-01-01), None
patent: WO 02/093209 (2002-11-01), None
patent: WO 02/093257 (2002-11-01), None
patent: WO 02/097508 (2002-12-01), None
patent: WO 02/099500 (2002-12-01), None
patent: WO 03/001271 (2003-01-01), None
patent: WO 03/003429 (2003-01-01), None
patent: WO 03/007046 (2003-01-01), None
patent: WO 03/009021 (2003-01-01), None
patent: WO 03/009050 (2003-01-01), None
patent: WO 03/009062 (2003-01-01), None
patent: WO 03/046634 (2003-06-01), None
patent: WO 03/077007 (2003-09-01), None
patent: WO 03/077011 (2003-09-01), None
patent: WO 03/088330 (2003-10-01), None
patent: WO 04/008254 (2004-01-01), None
Kurt Nattermann, “Birefringence of CaF2”, International SEMATECH Calcium Fluoride Birefringence, Workshop on, Jul. 2001.
A.E. Ennos, “High -precision tunable retardation plate for use with visible and ultra-violet polarized light”. Research Laboratory, Assoicated Electrical Industries, Aldermaston, Berkshire, U.K. (no date).
U.S. Appl. No. 60/295,212.
U.S. Appl. No. 60,296,694.
U.S. Appl. No. 60/299,497.
U.S. Appl. No. 60/299,603.
U.S. Appl. No. 60/335,093.
U.S. Appl. No. 60/332,183.
Burnett, J.H. et al., “Intrinsic Birefringence in 157 nm Materials,” Proceedings of the International Symposium on 157NM Lithography, Dana Point, CA, May 15, 2001, XP002218849, pp. 1-13.
Burnett, J.H. et al., “Intrinsic Birefringence in calcium fluoride,” preprinted handed out at 2ndInternational Symposium on 157NM Lithography, Dana Point, CA, May 15, 2001, XP002232195, pp. 1-17.
Yeh, P. et al., “Optics of Liquid Crystal Displays,” John Wiley & Sons, Inc., New York, 1999, pp. 380-385.
U.S. Appl. No. 10/331,159, filed Dec. 26, 2002, titled Structures and Methods for Reducing Polarization Aberration in Opitcal Systems.
U.S. Appl. No. 10/331,101, filed Dec. 26, 2002, titled Methods for Reducing Polarization Aberration in Optical Systems.
U.S. Appl. No. 10/331,103, filed Dec. 26, 2002, titled Structures and Methods for Reducing Polarization Aberration in Integrated Circuit Fabrication Systems.
Burnett et al., “Intrinsic Birefringence in 157 nm Materials,” Proc. 2nd, Intl. Symp on 157 nm Lithography, 2001, pp. 1-13, International SEMATECH, Austin, Texas.
D. Krähmer, “Intrinsic Birefringence in CaF2,” at CaF2Birefringence Workshop, Intl SEMATECH, Jul. 18, 2001, pp. 1-9.
Morton et al., “Testing Optical Damage for 157 nm Lithography,” Semiconductor International, http://www.e-insite.net/semiconductor/index.asp?layout=article&stt (Feb. 2002).
A. Hand, “157 nm Optics Demand a Bag of Tricks,” Semiconductor International, http://www.e-insite.net/semiconductor/index.asp?layout=article&stt Feb. 2002.
Shiraishi et al., “Current Status of Nikon's Investigation on CaF2Intrinsic Birefringenece,”International-SEMATECH Calcium Fluoride Birefringence Workshop, Jul. 18, 2001, pp. 1-15.
Burnett et al., “Intrinsic birefringence in calcium fluoride and barium fluoride,” Physical Review B, vol. 64, pp. 241102-1-241102-4, Dec. 15, 2001.
Burnett, et al., “Minimizing spatial-dispersion-induced birefrindgence in crystals for precision optics by using mixed crystals of materials with t opposite sign of the birefringence,” National Institute of Standards and Technology, Gaithersburg, Maryland 20899, http://physics.nist.gov/Divisions/Div842/GP3/DUVMatChar/birefing.ht (Jul. 12, 2001), pp. 1-3.
Burnett et al., “Alternative Materials Development (LITJ216) Final Report—Stress Birefringence, and

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Methods for reducing aberration in optical systems does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Methods for reducing aberration in optical systems, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods for reducing aberration in optical systems will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3692242

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.