Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2006-11-14
2006-11-14
Healy, Brian (Department: 2883)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492100, C250S493100
Reexamination Certificate
active
07135693
ABSTRACT:
A system and method are used to recycle gases in a lithography tool. A first chamber includes an element that emits light based on a first gas. A second chamber uses the emitted light to perform a process and includes the second gas. The first and second gases converge between the two chambers, and at least one of the gases is pumped to a storage device. From the storage device, at least one of the two gases is recycled either within the system or remote from the system and possibly reused within the system. A gaslock can couple the first chamber to the second chamber. A gas source supplies a third gas between the first and the second gas in the gaslock, such that the first gas is isolated from the second gas in the gaslock. The first, second, and/or third gas can be pumped to the storage device and routed to the recycling device. The first, second, and/or third gas can be recycled for reuse to form the emitting light.
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ASML Holding N.V.
El-Shammaa Mary
Healy Brian
Sterne Kessler Goldstein & Fox P.L.L.C.
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