Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2006-02-14
2006-02-14
Tugbang, A. Dexter (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C029S603130, C029S603150, C029S603160, C029S603180, C204S192340, C216S022000, C216S040000, C360S322000
Reexamination Certificate
active
06996894
ABSTRACT:
Methods of making a read head with improved contiguous junctions are described. After sensor layer materials are deposited over a substrate, a lift-off mask is formed over the sensor layer materials in a central region which is surrounded by end regions. Ion milling is performed with use of the lift-off mask such that the sensor layer materials in the end regions are removed and those in the central region remain to form a read sensor. A high-angle ion mill (e.g. between 45–80 degrees) is then performed to remove redeposited material from side walls of the lift-off mask. Next, a reactive ion etch (RIE) is used to reduce the thickness and the width of the lift-off mask and to remove capping layer materials from the top edges of the read sensor. With the reduced-size lift-off mask in place, hard bias and lead layers are deposited adjacent the read sensor as well as over the mask. The reduced-size lift-off mask allows the amount of hard bias to be increased in the contiguous junction region, and the edges of the leads to be deposited more closely over the top edges of the read sensor. Advantageously, the stability of the sensor is enhanced and the transfer curve is improved using a method which can be controlled independently from the initial mask structure and ion milling process. No critical alignments or multiple photoresist processes are necessary.
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Hsiao Richard
Jayasekara Wipul Pemsiri
Pinarbasi Mustafa
Webb Patrick Rush
Hitachi Global Storage Technologies - Netherlands B.V.
Oskorep, Esq. John J.
Tugbang A. Dexter
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