Semiconductor laser device with antimony and crystal growth...

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With particular dopant material

Reexamination Certificate

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C257S103000

Reexamination Certificate

active

07141829

ABSTRACT:
A semiconductor device (100) has, as its well layer, a III–V compound semiconductor layer (106) containing, as V-group components, nitrogen, antimony, and one or more V-group elements other than nitrogen and antimony to improve emission characteristics. Such a III–V compound semiconductor layer is formed by repeating a cycle including a process of simultaneously supplying a plurality of sources containing at lest indium, and a process of simultaneously supplying a plurality of sources not containing indium but containing antimony.

REFERENCES:
patent: 6541297 (2003-04-01), Takahashi
patent: 6798809 (2004-09-01), Gambin et al.
patent: 2000-312054 (2000-11-01), None
patent: 2001-24282 (2001-01-01), None
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Yang et al; “High-Temperature Characteristics of 1.3 μm InGaAsN:Sb/GaAs Multiple-Quantum-Well Lasers Grown by Molecular-Beam Epitaxy”; American Institute of Physics, Applied Physics Letters; Feb. 14, 2000, vol. 76, No. 7, pp. 795-797.
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Shimizu et al; “Extremely Large Differential Gain of 1.26μm GaInNAsSb-SQW Ridge Lasers”; Electronics Letters, Jan. 4, 2001, vol. 37, No. 1, pp. 28-31.
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Shimizu et al, “1.2μm Range GainAs SQW Lasers Using Sb as Surfactant”, Electronic Letters, vol. 36, No. 18, Aug. 3, 2000, pp. 1379-1381.

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