X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2006-06-13
2006-06-13
Bruce, David V. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S088000
Reexamination Certificate
active
07062014
ABSTRACT:
An object is to reduce the influence of chlorine in plastics when the metal concentrations in the plastics are analyzed. In an X-ray analyzer including an X-ray generating part for irradiating primary X-rays onto a sample and an X-ray detector for detecting an X-ray from the sample, primary X-rays is irradiated onto a plastic sample from the X-ray generating part, the X-ray intensity of chlorine is obtained from the plastic sample by the X-ray detector, and the scattered X-ray intensity where the primary X-ray has been scattered by the plastic sample is obtained by the X-ray detector. A chlorine X-ray intensity ratio calculating means for dividing the X-ray intensity of chlorine by the scattered X-ray intensity to calculate a chlorine X-ray intensity ratio is provided. The calculated chlorine X-ray intensity ratio and the chlorine concentration in the plastic sample have positive correlation each other. A relative chlorine concentration calculating means adapted to calculate the relative chlorine concentration in the plastic sample from the chlorine X-ray intensity ratio is provided.
REFERENCES:
patent: 5115459 (1992-05-01), Bertozzi
patent: 5457726 (1995-10-01), Miyazaki
Adams & Wilks
Bruce David V.
SII NanoTechnology Inc.
Song Hoon
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