Liquid crystal cells – elements and systems – Particular structure – Having significant detail of cell structure only
Reexamination Certificate
2006-06-06
2006-06-06
Schechter, Andrew (Department: 2871)
Liquid crystal cells, elements and systems
Particular structure
Having significant detail of cell structure only
C430S321000, C430S325000, C250S492300
Reexamination Certificate
active
07057692
ABSTRACT:
It is an object of the present invention to provide an apparatus and a method for forming an alignment layer to align the orientation direction of liquid crystals. In an apparatus10for forming an alignment layer according to the present invention, the shape of an edge32aof a mask12for forming a slit14is determined by integrating the orientation direction of liquid crystals. The liquid crystals can be uniformly oriented by the edge32ahaving such shape. This leads to the manufacturing of a liquid crystal display free from irregularity in brightness and color.
REFERENCES:
patent: 5486403 (1996-01-01), Ishitaka et al.
patent: 5770826 (1998-06-01), Chaudhari et al.
patent: 6061114 (2000-05-01), Callegari et al.
patent: 6061115 (2000-05-01), Samant et al.
patent: 6124914 (2000-09-01), Chaudhari et al.
patent: 6313896 (2001-11-01), Samant et al.
patent: 6331381 (2001-12-01), Chaudhari et al.
patent: 6377326 (2002-04-01), Kuo et al.
patent: 6479218 (2002-11-01), Choi
patent: 2002/0001057 (2002-01-01), Chaudhari et al.
patent: 07-056172 (1995-03-01), None
patent: 7-056172 (1995-03-01), None
patent: 9-244027 (1997-09-01), None
patent: 10-253962 (1998-09-01), None
patent: 11-160711 (1999-06-01), None
Nakano Hiroki
Odahara Shuhichi
Okazaki Nobuo
Saitoh Yukito
Abate Esq. Joseph P.
Caley Michael H.
Ohlandt Greeley Ruggiero & Perle L.L.P.
Schechter Andrew
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