Wells – Processes – Material placed in pores of formation to treat resident...
Reexamination Certificate
2006-02-28
2006-02-28
Bates, Zakiya W. (Department: 3676)
Wells
Processes
Material placed in pores of formation to treat resident...
C166S300000, C166S308200, C507S225000, C507S226000
Reexamination Certificate
active
07004254
ABSTRACT:
Aqueous treatment fluids that comprise water, and a friction reducing copolymer that comprises acrylamide in an amount in the range of from about 60% to about 90% by weight and acrylic acid in an amount in the range of from about 10% to about 20% by weight. Methods of treating portions of subterranean formation using the aqueous treatment fluid that comprise providing an aqueous treatment fluid comprising water, and a friction reducing copolymer that comprises acrylamide in an amount in the range of from about 60% to about 90% by weight and acrylic acid in an amount in the range of from about 10% to about 20% by weight; and introducing the aqueous treatment fluid into the portion of the subterranean formation.
REFERENCES:
patent: 3442803 (1969-05-01), Hoover et al.
patent: 3562226 (1971-02-01), Gayley et al.
patent: 3768565 (1973-10-01), Persinski et al.
patent: 4500437 (1985-02-01), Engelhardt et al.
patent: 4694046 (1987-09-01), Bock et al.
patent: 5065822 (1991-11-01), Miller et al.
patent: 6169058 (2001-01-01), Le et al.
patent: 6454008 (2002-09-01), Chatterji et al.
patent: 6784141 (2004-08-01), King et al.
Chatterji Jiten
King Karen L.
McMechan David E.
Baker & Botts
Bates Zakiya W.
Halliburton Energy Service,s Inc.
Kent Robert A.
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