Process for the removal of low level (ppm) halogenated contamina

Details Process for the removal of low level (ppm) halogenated contamina Process for the removal of low level (ppm) halogenated contamina

1980-02-04

1981-08-18

Castel, Benoit

Liquid purification or separation

Processes

Chemical treatment

210909, 252181, 570204, 585469, C02F 170

Patent

active

042845165

ABSTRACT:
There is disclosed a process for the removal of low level halogenated organic compounds forming a fluid through treatment with an alkali metal aromatic radical anion reagent.

REFERENCES:
Oku, A. et al., "A Complete Dechlorination of Polychlorinated Biphenyl by Sodium Naphtalene", Chemistry & Industry, vol. 21, pp. 841-842 (1978).
Oku, A. et al., "Reduction of 6,6-Disubstituted Fulvenes and 1,2-Benzoheptafulvene by Naphtalene Radical Anion", Bull. of the Chem. Soc. of Japan, vol. 52 (2), 524-528 (1979).

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