Electrooptic system array, charged-particle beam exposure...

Details Electrooptic system array, charged-particle beam exposure... Electrooptic system array, charged-particle beam exposure...

2006-10-24

2006-10-24

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492210, C250S492200, C250S492300

Reexamination Certificate

active

07126141

ABSTRACT:
A charged-particle beam exposure apparatus includes a charged-particle beam source for emitting a charged-particle beam, an electrooptic system array which has a plurality of electron lenses and forms a plurality of intermediate images of the charged-particle beam source by the plurality of electron lenses, and a projection electrooptic system for projecting on a substrate the plurality of intermediate images formed by the electrooptic system array. The electrooptic system array includes at least two electrodes arranged along paths of a plurality of charged-particle beams, each of the at least two electrodes having a plurality of apertures on the paths of the plurality of charged-particle beams, and a shield electrode which is interposed between the at least two electrodes and has a plurality of shields corresponding to the respective paths of the plurality of charged-particle beams.

REFERENCES:
patent: 3755704 (1973-08-01), Spindt et al.
patent: 4200794 (1980-04-01), Newberry et al.
patent: 4354111 (1982-10-01), Williams et al.
patent: 4419182 (1983-12-01), Westerberg et al.
patent: 4419580 (1983-12-01), Walker et al.
patent: 4569033 (1986-02-01), Collins et al.
patent: 4607167 (1986-08-01), Petric
patent: 4742234 (1988-05-01), Feldman et al.
patent: 5105089 (1992-04-01), Yamada
patent: 5121234 (1992-06-01), Kucera
patent: 5215623 (1993-06-01), Takahashi et al.
patent: 5260579 (1993-11-01), Yasuda et al.
patent: 5324930 (1994-06-01), Jech, Jr.
patent: 5534311 (1996-07-01), Shaw et al.
patent: 5604394 (1997-02-01), Saito et al.
patent: 5617131 (1997-04-01), Murano et al.
patent: 5637907 (1997-06-01), Leedy
patent: 5726539 (1998-03-01), Spanjer et al.
patent: 5731591 (1998-03-01), Yamada
patent: 5834783 (1998-11-01), Muraki et al.
patent: 5838119 (1998-11-01), Engle
patent: 5864142 (1999-01-01), Muraki et al.
patent: 5905267 (1999-05-01), Muraki
patent: 5929454 (1999-07-01), Muraki et al.
patent: 5939725 (1999-08-01), Muraki
patent: 5942761 (1999-08-01), Tuli
patent: 5973332 (1999-10-01), Muraki et al.
patent: 5981954 (1999-11-01), Muraki
patent: 6013976 (2000-01-01), Gorski et al.
patent: 6014200 (2000-01-01), Sogard et al.
patent: 6072251 (2000-06-01), Markle
patent: 6104035 (2000-08-01), Muraki
patent: 6107636 (2000-08-01), Muraki
patent: 6121625 (2000-09-01), Ito et al.
patent: 6137103 (2000-10-01), Giles et al.
patent: 6137113 (2000-10-01), Muraki
patent: 6166387 (2000-12-01), Muraki et al.
patent: 6184850 (2001-02-01), Suzuki et al.
patent: 6188074 (2001-02-01), Satoh et al.
patent: 6274877 (2001-08-01), Muraki
patent: 6323499 (2001-11-01), Muraki et al.
patent: 6337485 (2002-01-01), Muraki
patent: 6381072 (2002-04-01), Burger
patent: 6465796 (2002-10-01), Haraguchi et al.
patent: 6469799 (2002-10-01), Kajita
patent: 6472672 (2002-10-01), Muraki
patent: 6483120 (2002-11-01), Yui et al.
patent: 6515409 (2003-02-01), Muraki et al.
patent: 6566664 (2003-05-01), Muraki
patent: 6603128 (2003-08-01), Maehara et al.
patent: 6617595 (2003-09-01), Okunuki
patent: 6657210 (2003-12-01), Muraki
patent: 6777697 (2004-08-01), Yui et al.
patent: 6872950 (2005-03-01), Shimada et al.
patent: 6872951 (2005-03-01), Yagi et al.
patent: 6872952 (2005-03-01), Shimada et al.
patent: 6903345 (2005-06-01), Ono et al.
patent: 6903352 (2005-06-01), Muraki et al.
patent: 2001/0052576 (2001-12-01), Shimada et al.
patent: 2001/0054690 (2001-12-01), Shimada et al.
patent: 2002/0009901 (2002-01-01), Maehara et al.
patent: 2002/0051111 (2002-05-01), Greene et al.
patent: 2002/0063531 (2002-05-01), Aarnink
patent: 2002/0160311 (2002-10-01), Muraki et al.
patent: 2002/0179855 (2002-12-01), Muraki
patent: 2003/0094584 (2003-05-01), Yui et al.
patent: 2003/0209673 (2003-11-01), Ono et al.
patent: 2004/0061064 (2004-04-01), Ono et al.
patent: 56-19402 (1981-05-01), None
patent: 6-44093 (1994-02-01), None
patent: 2001-126651 (2001-05-01), None
“Sub-Nanometer Miniature Electron Microscope”, A.D. Feinerman, et al., Journal of Vacuum Science and Technology A, vol. 10, No. 4, Jul./Aug. 1992, 611-616.
“High Aspect Ratio Aligned Multilayer Microstructure Fabrication”, K. Y. Lee, et al., Journal of Vacuum Science and Technology B, vol. 12, No. 6, Nov./Dec. 1994, pp. 3425-3430.
“Arrayed Miniature Electron Beam Columns For High Throughput Sub-100 nm Lithography”, T. H. P. Chang, et al., Journal of Vacuum Science and Technology B, vol. 10, No. 6, Nov./Dec. 1992, pp. 2743-2748.
“Microstructures for Particle Beam Control”, G. W. Jones, et al., Journal of Vacuum Science and Technology B, vol. 6, No. 6, Nov./Dec. 1988, pp. 2023-2027.
“A Multibeam Scheme for Electron-Beam Lithography”, T. Sasaki, Journal of Vacuum Science and Technology, vol. 19, No. 4, Nov./Dec. 1981, pp. 963-965.

Affiliated with

Also associated with

Rating

Electrooptic system array, charged-particle beam exposure... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrooptic system array, charged-particle beam exposure..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrooptic system array, charged-particle beam exposure... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3659352