Method to form an embedded micro-pedestal in a conductive layer

Details Method to form an embedded micro-pedestal in a conductive layer Method to form an embedded micro-pedestal in a conductive layer

2006-11-14

2006-11-14

Tugbang, A. Dexter (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603020, C029S603120, C029S603140, C029S603160, C029S846000, C029S847000, C029S831000, C029SDIG016, C204S192340

Reexamination Certificate

active

07134182

ABSTRACT:
Conventional liftoff processes used to define track width in magnetic read heads can produce an uneven etch-depth of dielectric materials around the sensor and cause shorting to the overlay top lead layer. This problem has been overcome by printing the images of track width and stripe height onto an intermediate layer to form a hard mask. Through this hard mask, the GMR stack can be selectively etched and then back-filled with a high-resistivity material by using newly developed electroless plating processes.

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patent: 6419845 (2002-07-01), Sasaki
patent: 6462915 (2002-10-01), Sasaki

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