Organic compounds -- part of the class 532-570 series – Organic compounds – Azo
Patent
1998-06-19
2000-03-07
Marquis, Melvyn I.
Organic compounds -- part of the class 532-570 series
Organic compounds
Azo
524848, 524862, 525478, 528 15, 528 32, 528 35, C08K 554
Patent
active
060342250
DESCRIPTION:
BRIEF SUMMARY
TECHNICAL FIELD
The invention relates to organopolysiloxanes which contain aliphatically unsaturated radicals and are soluble in organic solvents, to processes for their preparation and to their use in crosslinkable organopolysiloxane compositions, especially for producing adhesive-repellent organopolysiloxane films.
BACKGROUND OF THE INVENTION
EP 0403890 B1 (Bayer AG; published on Mar. 16, 1994) or the corresponding U.S. Pat. No. 5,077,369, and EP 0640662 A2 (Bayer AG; published on Mar. 1, 1995), describe addition-crosslinking organopolysiloxane mixtures for producing adhesion-reducing coatings. The organopolysiloxanes present in the mixtures are branched, with the branching sites being constituted by trifunctional monoorganosiloxy groups, so-called T units, or tetrafunctional siloxy groups, so-called Q units, and the organopolysiloxanes described have at least 12 T units per molecule. Moreover, they possess triorganosiloxy groups, so-called M units, some of which are free from unsaturated radicals while the remainder carry only one unsaturated radical each. The organopolysiloxanes are prepared by hydrolyzing chlorosilanes and then carrying out polymerization with low molecular mass cyclic diorganopolysiloxanes. U.S. Pat. No. 4,772,515 (Shin-Etsu Chemical Co.; published on Sep. 20, 1988) likewise claims addition-crosslinking organopolysiloxane mixtures for producing adhesive-repellent organopolysiloxane coatings. The organopolysiloxanes present have at least two branching sites per molecule, in the form of T units, and each terminal Si atom possesses at least one unsaturated group. The organopolysiloxanes are prepared by reacting alkyltrimethoxysilanes with octamethylcyclotetrasiloxane in the presence of a basic catalyst, followed by hydrolysis and reaction with alkenyldisiloxanes.
SUMMARY OF THE INVENTION
The invention provides organopolysiloxanes containing aliphatically unsaturated radicals, which are soluble in organic solvents selected from the group consisting of xylenes and toluene to an extent of at least 80 percent by weight, preferably 90 percent by weight, particularly preferably 100 percent by weight, at a temperature of 25.degree. C. and a pressure of from 900 to 1100 hPa, and comprise at least one unit of the formula unsubstituted, SiC-bonded, aliphatically saturated hydrocarbon radical, substituted or unsubstituted, aliphatically unsaturated hydrocarbon radical, carbon atoms, where n is 0 or an integer from 1 to 3, particularly preferably 0 or 1, and R.sup.3 is a hydrogen atom or is as defined for R, the formula (II) where b is not 0.
In addition to the units of the formula (I), (II), (III) and if appropriate (IV) the novel organopolysiloxanes may have further siloxane units, for example those of the formula O.sub.2/2 RSiO.sub.x YRSiO.sub.2/2 and O.sub.2/2 RSiO.sub.x YR.sub.2 SiO.sub.1/2, although this is not preferred.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
The term organopolysiloxanes is intended in the context of the present invention to embrace not only polymeric but also dimeric and oligomeric siloxanes.
The novel organopolysiloxanes preferably include at least two units of the formula (II) where b=1.
The radical R preferably comprises substituted or unsubstituted, monovalent, SiC-bonded, aliphatically saturated hydrocarbon radicals having 1 to 18 carbon atoms.
Examples of each radical R are alkyl radicals such as the methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, n-pentyl, isopentyl, neopentyl and the tert-pentyl radicals, hexyl radicals, such as the n-hexyl radical, heptyl radicals, such as the n-heptyl radical, octyl radicals, such as the n-octyl radical and isooctyl radicals, such as the 2,2,4-trimethylpentyl and the 2-ethylhexyl radical, nonyl radicals, such as the n-nonyl radical, decyl radicals, such as the n-decyl radical, dodecyl radicals, such as the n-dodecyl radical, tetradecyl radicals, such as the n-tetradecyl radical, hexadecyl radicals, such as the n-hexadecyl radical, and octadecyl radicals, such as the n-octadecyl radical, cycloalkyl ra
REFERENCES:
patent: 4772515 (1988-09-01), Hara et al.
patent: 4871827 (1989-10-01), Klosowski et al.
patent: 5077369 (1991-12-01), DeMontigny et al.
patent: 5247046 (1993-09-01), Takago et al.
For German Patent Appl. P 4436817.8 the corresponding.
Hockemeyer Friedrich
Weidner Richard
Marquis Melvyn I.
Wacker-Chemie GmbH
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