Laser irradiation method, laser irradiation apparatus, and...

Coherent light generators – Particular beam control device – Having particular beam control circuit component

Reexamination Certificate

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C372S043010, C372S050100, C372S057000, C372S064000, C372S007000, C372S039000, C372S015000, C219S121800, C219S121610, C219S121660, C219S121650, C219S121850

Reexamination Certificate

active

07095762

ABSTRACT:
An object of the present invention is obtaining a semiconductor film with uniform characteristics by improving irradiation variations of the semiconductor film. The irradiation variations are generated due to scanning while irradiating with a linear laser beam of the pulse emission. At a laser crystallization step of irradiating a semiconductor film with a laser light, a continuous light emission excimer laser emission device is used as a laser light source. For example, in a method of fabricating an active matrix type liquid crystal display device, a continuous light emission excimer laser beam is irradiated to a semiconductor film, which is processed to be a linear shape, while scanning in a vertical direction to the linear direction. Therefore, more uniform crystallization can be performed because irradiation marks can be avoided by a conventional pulse laser.

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